Colorant-containing curable composition, color filter using the composition, and method for manufacturing the same

ABSTRACT

The present invention provides a colorant-containing curable composition comprising a colorant, wherein the colorant contains a compound represented by the following Formula (I). 
     
       
         
         
             
             
         
       
     
     In Formula (I), R 1  and R 2  each independently represent H, an alkyl group, an alkenyl group, an aryl group, or an aralkyl group. R 1  and R 2  may be formed into a heterocycle together with a jointly bonded nitrogen atom. R 3  represents a halogen atom, a trihalomethyl group, an alkoxy group, a nitro group, or an amino group. n represents an integer of 0 to 4. R 4  represents a halogen atom or a —SO 3 M group, in which M represents H, a cation of a metallic atom, or a cation consisting of a nitrogen-containing compound. m represents an integer of 0 to 5. 
     The present invention further provides a color filter comprising the compound represented by Formula (I) and a method for manufacturing the color filter.

CROSS-REFERENCE TO RELATED APPLICATION

This is a Divisional application of U.S. Ser. No. 11/095,515 filed Apr.1, 2005, now U.S. Pat. No. 7,276,548, which claims priority under 35U.S.C. 119 from Japanese Patent Application Nos. 2004-110469 and2004-146659, the disclosures of which are incorporated by referenceherein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a colorant-containing curablecomposition for a color filter that is suitable for forming a coloredimage of a color filter for use with a liquid crystal display device, asolid image pickup element (such as a CCD or a CMOS) and the like, acolor filter, and a method for manufacturing the same.

2. Description of the Related Art

As methods for manufacturing a color filter for use with a liquidcrystal display device or a solid image pickup element, dyeing methods,printing methods, electrodeposition methods, and pigment dispersionmethods are known.

Among these, the pigment dispersion method is a method for manufacturinga color filter by a photolithography method including using a coloredradiation-sensitive composition in which pigments are dispersed invarious photosensitive compositions. The pigment dispersion method hasan advantage of stability against light, heat and the like, because ofthe use of pigments. In addition, because the pigment dispersion methodconducts patterning by the photolithography method, it gives highpositioning accuracy. Therefore, the pigment dispersion method has beenwidely used as a method which is suitable for manufacturing colorfilters for color displays of large-screens and high-precision.

In order to manufacture a color filter by the pigment dispersion method:a radiation-sensitive composition is coated on a glass substrate bymeans of a spin coater, a roll coater, or the like, and dried to form acoating film; the coating film is exposed to light through a maskpattern, and developed to form colored pixels; and this cycle ofoperation is repeated for each color.

A negative photosensitive composition, which uses a photopolymerizablemonomer and a photopolymerization initiator in an alkali soluble resin,is conventionally known as a specific example of the sensitivecompositions used in the pigment dispersion method (see, for example,Japanese Patent Application Laid-Open (JP-A) Nos. 2-199403, 4-76062,5-273411, 6-184482, and 7-140654).

In recent years, for applications such as solid image pickup elements,higher precision of the color filter has been demanded. However, it isdifficult to further improve the resolution with the conventionalpigment dispersion system. In addition, there are problems, such asirregular color being caused by coarse particles of the pigment.Therefore, the above-mentioned pigment dispersion method has not beensuited for applications such as solid image pickup elements whereextremely fine patterns are required.

In order to solve the above-mentioned problems, examples where a solventor water soluble dye is used have been conventionally known (see, forexample, Japanese Patent Application Laid-Open (JP-A) No. 2002-278056).

However, the dye-containing curable composition has the followingproblems (1) to (4).

-   -   (1) Generally, coloring matter has a low solubility in either        alkali water solutions or organic solvents, thus it is difficult        to obtain a liquid curing composition having the desired        spectrum.    -   (2) Dyes often interact with other components in the curable        composition, thus it is difficult to adjust the solubility of        the curing part and the non-curing part (developability).    -   (3) When the dye has a low molar absorption coefficient (ε), the        dye must be added in a large quantity, thus it is inevitable        that the amounts of the other components in the curable        composition, such as the polymerizable compound (monomer), the        binder, and the photopolymerization initiator, must be reduced.        This presents such problems as the lowering of the curability of        the composition, the heat resistance after curing, and the        developability of the (non-)curing part.    -   (4) Dyes are generally inferior in light resistance and heat        resistance, as compared to pigments.

In addition, especially for the application for manufacturing of a colorfilter for a solid image pickup element, it is required that the filmthickness be 1.5 μm or less, unlike in semiconductor manufacturingapplications. Therefore, the coloring matter must be added to thecurable composition in a large quantity, which presents the sameproblems as mentioned above.

Because of the above-mentioned problems, it has been difficult inpractice to meet the requirements for performance for use in extremelyfine, thin-film colored patterns for high-precision color filters.Therefore, development of a dye and curable composition which caneliminate the above-mentioned problems has been desired.

SUMMARY OF THE INVENTION

The present invention has been made in view of the above circumstancesand provides a colorant-containing curable composition which has: a highsensitivity, a high resolution, a high heat resistance, and a widedevelopment latitude; yet is free from elution of the dye; is excellentin solvent resistance of the pattern; and with high productivity. Alsoprovided is a color filter using the same, and the manufacturing methodof the same.

Particularly, the present invention provides a colorant-containingcurable composition which is excellent in molar absorbance coefficientand color value of the dye, light resistance, heat resistance, andpattern formability (developability), as well as a color filter usingthe same, and the manufacturing method of the same.

According to the present invention, a colorant-containing curablecomposition for a color filter containing the following compound with aspecific structure having an aminopyrazolone skeleton together with asulfonamide group is provided to achieve the purpose of the presentinvention.

Namely, the present invention provides a colorant-containing curablecomposition comprising a colorant, wherein the colorant contains acompound represented by the following Formula (I).

In Formula (I), R¹ and R² each independently represent a hydrogen atom,an alkyl group having 1 to 21 carbon atoms, an alkenyl group having 2 to21 carbon atoms, an aryl group having 6 to 21 carbon atoms, or anaralkyl group having 7 to 21 carbon atoms. R¹ and R² may be formed intoa heterocycle together with a jointly bonded nitrogen atom. R³represents a halogen atom, a trihalomethyl group, an alkoxy group having1 to 21 carbon atoms, a nitro group, or an amino group. n represents aninteger of 0 to 4. R⁴ represents a halogen atom or a —SO₃M group, inwhich M represents a hydrogen atom, a cation of a metallic atom, or acation consisting of a nitrogen-containing compound. m represents aninteger of 0 to 5.

The present invention further provides a color filter comprising thecompound represented by Formula (I).

The present invention further provides a method for manufacturing thecolor filter, comprising coating a colorant-containing curablecomposition on a support, exposing the resultant to light through amask, and developing the resultant to form a pattern, wherein thecolorant-containing curable composition at least contains a colorant,and the colorant contains the compound represented by Formula (I).

DETAILED DESCRIPTION OF THE INVENTION

Hereinafter, the colorant-containing curable composition of the presentinvention, the color filter, and the manufacturing method thereof willbe described in detail.

Colorant-containing Curable Composition

The colorant-containing curable composition of the present invention(which, hereinafter, may sometimes be referred to as “the composition ofthe present invention”) is a colorant-containing curable compositionwhich contains at least a colorant, wherein said colorant contains acompound which is represented by the following Formula (I):

In Formula (I), R¹ and R² each independently represent a hydrogen atom,an alkyl group having 1 to 21 carbon atoms, an alkenyl group having 2 to21 carbon atoms, an aryl group having 6 to 21 carbon atoms, or anaralkyl group having 7 to 21 carbon atoms. R¹ and R² may be formed intoa heterocycle together with a jointly bonded nitrogen atom. R³represents a halogen atom, a trihalomethyl group, an alkoxy group having1 to 21 carbon atoms, a nitro group, or an amino group. n represents aninteger of 0 to 4. R⁴ represents a halogen atom, or an —SO₃M group, inwhich M represents a hydrogen atom, a cation of a metallic atom, or acation consisting of a nitrogen-containing compound. m represents aninteger of 0 to 5.

By containing a compound which is represented by Formula (I), thecomposition of the present invention is capable of showing excellentperformance in heat resistance, light resistance, and molar absorptioncoefficient (color value) of the colorant.

In addition, because the composition of the present invention has beenimproved especially in color value, the amount of addition of the dyecan be reduced. Thereby, the contents of the other additives can beincreased, and thus the various performances of the resist can beimproved. Further, according to the composition of the presentinvention, the developability of the unexposed areas and the percentageof film remaining for the exposed areas can be improved, thus a goodpattern formability can be provided. In addition, the composition of thepresent invention provides high productivity, because there is nopossibility of degradation of the various above-mentioned performancesin the manufacturing process.

The composition of the present invention contains at least a colorant,and this is generally used with a solvent. In addition, when required,it may contain a binder, a polymerizable compound, a photopolymerizationinitiator, a crosslinking agent, a photo sensitizer, a photo-acidgenerator, or the like.

Specifically, when the composition of the present invention is ofnegative composition, it may contain a solvent, a polymerizable compound(monomer), a binder (preferably, an alkali soluble binder) and aphotopolymerization initiator in addition to the above-mentionedcolorant, and further may contain a crosslinking agent.

When the composition of the present invention is a positive composition,it contains an organic solvent or curing agent, and a photo sensitizeror a photo-acid generator, in addition to the above-mentioned colorant.

The composition of the present invention contains a compound representedby Formula (I) as a colorant. The composition of the present inventionmay contain two or more different compounds represented by Formula (I).Hereinafter, the colorant (coloring matter compound) in the presentinvention will be described in detail.

The compound represented by the above-mentioned Formula (I) is acompound which simultaneously meets the requirements for high lightresistance and high heat resistance (not conventionally possible), andis capable of being freely dissolved in water or a solvent as needed.

In Formula (I), R¹ and R² each independently represent a hydrogen atom,an alkyl group having 1 to 21 carbon atoms, an alkenyl group having 2 to21 carbon atoms, an aryl group having 6 to 21 carbon atoms, or anaralkyl group having 7 to 21 carbon atoms. R¹ and R² may be formed intoa heterocycle together with a jointly bonded nitrogen atom.

In Formula (I), the alkyl group having 1 to 21 carbon atoms that isrepresented by R¹ and R² may have a substituent. In addition, the alkylgroup having 1 to 21 carbon atoms may be a straight-chain or branchedgroup, or otherwise a cyclic alkyl group.

Preferable examples of the alkyl group include a methyl group, an ethylgroup, an n-propyl group, an n-butyl group, an n-amyl group, an n-hexylgroup, an n-heptyl group, an n-octyl group, an n-nonyl group, an n-decylgroup, an n-undecyl group, an n-dodecyl group, an n-tridecyl group, ann-tetradecyl group, an n-pentadecyl group, an n-hexadecyl group, ann-heptadecyl group, an n-octadecyl group, an n-nonadecyl group, ann-eicosanyl group, an i-propyl group, a sec-butyl group, an i-butylgroup, a t-butyl group, a 1-methylbutyl group, a 1-ethylpropyl group, a2-methylbutyl group, an i-amyl group, a neopentyl group, a1,2-dimethylpropyl group, a 1,1-dimethylpropyl group, a t-amyl group, a1,3-dimethylbutyl group, a 3,3-dimethylbutyl group, a 2-ethylbutylgroup, a 2-ethyl-2-methylpropyl group, a straight-chain or branchedheptyl group, a 1-methylheptyl group, a 2-ethylhexyl group, a1,5-dimethylhexyl group, a t-octyl group, a branched nonyl group, abranched decyl group, a branched undecyl group, a branched dodecylgroup, a branched tridecyl group, a branched tetradecyl group, abranched pentadecyl group, a branched hexadecyl group, a branchedheptadecyl group, a branched octadecyl group, a straight-chain orbranched nonadecyl group, a straight-chain or branched eicosanyl group,a cyclopropyl group, a cyclopropylmethyl group, a cyclobutyl group, acyclobutylmethyl group, a cyclopentyl group, a cyclohexyl group, acyclohexylmethyl group, a cycloheptyl group, a cyclooctyl group, acyclohexylpropyl group, a cyclododecyl group, a norbornyl group, abornyl group, a cys-myrtanyl group, an isopinocamphenyl group, anoradamantyl group, an adamantyl group, an adamantylmethyl group, a1-(1-adamantyl)ethyl group, a 3,5-dimethyladamantyl group, aquinuclidinyl group, a cyclopentylethyl group, and a bicyclooctyl group.

Among these, the methyl group, the ethyl group, the n-propyl group, then-butyl group, the n-amyl group, the n-hexyl group, the n-heptyl group,the n-octyl group, the n-nonyl group, the n-decyl group, the n-undecylgroup, the n-dodecyl group, the n-tridecyl group, the n-tetradecylgroup, the i-propyl group, the sec-butyl group, the i-butyl group, thet-butyl group, the 1-methylbutyl group, the 1-ethylpropyl group, the2-methylbutyl group, the i-amyl group, the neopentyl group, the1,2-dimethylpropyl group, the 1,1-dimethylpropyl group, the t-amylgroup, the 1,3-dimethylbutyl group, the 3,3-dimethylbutyl group, the2-ethylbutyl group, the 2-ethyl-2-methylpropyl group, the straight-chainor branched heptyl group, the 1-methylheptyl group, the 2-ethylhexylgroup, the 1,5-dimethylhexyl group, the t-octyl group, the branchednonyl group, the branched decyl group, the branched undecyl group, thebranched dodecyl group, the branched tridecyl group, the branchedtetradecyl group, the cyclopropyl group, the cyclopropylmethyl group,the cyclobutyl group, the cyclobutylmethyl group, the cyclopentyl group,the cyclohexyl group, the cyclohexylmethyl group, the cycloheptyl group,the cyclooctyl group, the cyclohexylpropyl group, the cyclododecylgroup, the norbornyl group, the bornyl group, the cysinyrtanyl group,the isopinocamphenyl group, the noradamantyl group, the adamantyl group,the adamantylmethyl group, the 1-(1-adamantyl)ethyl group, the3,5-dimethyladamantyl group, the quinuclidinyl group, thecyclopentylethyl group, and the bicyclooctyl group are more preferable,and further the methyl group, the ethyl group, the n-propyl group, then-butyl group, the n-amyl group, the n-hexyl group, the n-heptyl group,the n-octyl group, the n-nonyl group, the n-decyl group, the i-propylgroup, the sec-butyl group, the i-butyl group, the t-butyl group, the1-methylbutyl group, the 1-ethylpropyl group, the 2-methylbutyl group,the i-amyl group, the neopentyl group, the 1,2-dimethylpropyl group, the1,1-dimethylpropyl group, the t-amyl group, the 1,3-dimethylbutyl group,the 3,3-dimethylbutyl group, the 2-ethylbutyl group, the2-ethyl-2-methylpropyl group, the straight-chain or branched heptylgroup, the 1-methylheptyl group, the 2-ethylhexyl group, the1,5-dimethylhexyl group, the t-octyl group, the branched nonyl group,the branched decyl group, the cyclopropyl group, the cyclopropylmethylgroup, the cyclobutyl group, the cyclobutylmethyl group, the cyclopentylgroup, the cyclohexyl group, the cyclohexylmethyl group, the cycloheptylgroup, the cyclooctyl group, the cyclohexylpropyl group, thecyclododecyl group, the norbornyl group, the bornyl group, thenoradamantyl group, the adamantyl group, the adamantylmethyl group, the1(1-adamantyl)ethyl group, the 3,5-dimethyladamantyl group, thecyclopentylethyl group, and the bicyclooctyl group are particularlypreferable.

Among the above-mentioned alkyl groups, in view of improvement in heatresistance, the ethyl group, the n-propyl group, the n-butyl group, then-amyl group, the n-hexyl group, the n-heptyl group, the n-octyl group,the n-nonyl group, the n-decyl group, the i-propyl group, the sec-butylgroup, the i-butyl group, the t-butyl group, the 1-methylbutyl group,the 1-ethylpropyl group, the 2-methylbutyl group, the i-amyl group, theneopentyl group, the 1,2-dimethylpropyl group, the 1,1-dimethylpropylgroup, the t-amyl group, the 1,3-dimethylbutyl group, the3,3-dimethylbutyl group, the 2-ethylbutyl group, the2-ethyl-2-methylpropyl group, the branched heptyl group, the1-methylheptyl group, the 1,5-dimethylhexyl group, the t-octyl group,the branched nonyl group, the branched decyl group, the cyclopropylgroup, the cyclopropylmethyl group, the cyclobutyl group, thecyclobutylmethyl group, the cyclopentyl group, the cyclohexyl group, thecyclohexylmethyl group, the cycloheptyl group, the cyclooctyl group, thecyclohexylpropyl group, the cyclododecyl group, the norbornyl group, thebornyl group, the noradamantyl group, the adamantyl group, theadamantylmethyl group, the 1(1-adamantyl)ethyl group, the3,5dimethyladamantyl group, the cyclopentylethyl group, and otherbranched alkyl groups and cyclic alkyl groups are particularlypreferable.

As the alkyl group represented by R¹ and R² in Formula (I), an alkylgroup which is specifically substituted by fluorine may be used.Specific preferable examples of the alkyl group include atrifluoromethyl group, a trifluoroethyl group, a pentafluoroethyl group,a heptafluoropropyl group, a nonafluorobutyl group, a tridecafluorohexylgroup, a pentadecafluoroheptyl group, a heptadecafluorooctyl group, atridecafluorooctyl group, a nonafluorononyl group, aheptadecafluorodecyl group, and a perfluorodecyl group are preferable;among these, the trifluoromethyl group, the pentafluoroethyl group, theheptafluoropropyl group, the nonafluorobutyl group, thetridecafluorohexyl group, and the pentadecafluoroheptyl group are morepreferable; and the trifluoromethyl group, the pentafluoroethyl group,the heptafluoropropyl group, the nonafluorobutyl group, and thetridecafluorohexyl group.

In Formula (I), the alkenyl group that has 2 to 21 carbon atoms and thatis represented by R¹ and R² may have a substituent. Preferable examplesof the alkenyl group having 2 to 21 carbon atoms and that is representedby R¹ and R² include a vinyl group, an isopropenyl group, a 2propenylgroup, a 2-methyl-propenyl group, a 1-methyl-1-propenyl group, a1-butenyl group, a 3butenyl group, a 1-methyl-1-butenyl group, a1,1-dimethyl-3butenyl group, a 1-pentenyl group, a 2-pentenyl group, a1-ethyl-1-pentenyl group, a 1-hexenyl group, a 1-heptenyl group, a2,6-dimethyl-5-heptenyl group, a 9-decenyl group, a 1-cyclopentenylgroup, a 2-cyclopentenylmethyl group, a cyclohexenyl group, a1-methyl-2-cyclohexenyl group, a 1,4dihydro-2-methylphenyl group, anoctenyl group, a citroneryl group, an oleyl group, a gelanyl group, afarnecyl group, and a 2-(1-cyclohexenyl)ethyl group; among these, thevinyl group, the isopropenyl group, the 2-propenyl group, the2-methyl-propenyl group, the 1-methyl-1-propenyl group, the 1-butenylgroup, the 3-butenyl group, the 1-methyl-1-butenyl group, the1,1-dimethyl-3butenyl group, the 1-pentenyl group, the 2-pentenyl group,the 1-ethyl-1-pentenyl group, the 1-hexenyl group, the 1-heptenyl group,the 1-cyclopentenyl group, the 2-cyclopentenylmethyl group, thecyclohexenyl group, the 1-methyl-2-cyclohexenyl group, and the1,4-dihydro-2-methylphenyl group are more preferable; and further, thevinyl group, the isopropenyl group, the 2-propenyl group, the2-methyl-propenyl group, the 1-methyl-1-propenyl group, the 1-butenylgroup, the 3-butenyl group, the 1-methyl-1-butenyl group, the1,1-dimethyl-3-butenyl group, the 1-pentenyl group, the 2-pentenylgroup, the 1-ethyl-1-pentenyl group, the 1-hexenyl group, the1-cyclopentenyl group, the 2-cyclopentenylmethyl group, the cyclohexenylgroup, the 1-methyl-2-cyclohexenyl group, and the1,4-dihydro-2-methylphenyl group are particularly preferable.

The aryl group that has 6 to 21 carbon atoms and that is represented byR¹ and R² may have a substituent. Preferable examples of the aryl groupthat has 6 to 21 carbon atoms and that may have a substituent include aphenyl group, a naphthyl group, biphenylenyl group, an acenaphtenylgroup, a fluolenyl group, an anthracenyl group, an anthraquinonyl group,a pirenyl group, and the like; among these, the phenyl group, thenaphthyl group, the biphenylenyl group, the acenaphtenyl group, thefluolenyl group, the anthracenyl group, and the like are morepreferable; and further, the phenyl group, the naphthyl group, thebiphenylenyl group, the fluolenyl group, and the like are particularlypreferable.

The aralkyl group that has 7 to 21 carbon atoms and that is representedby R¹ and R² may have a substituent.

Preferable examples of the aralkyl group that has 7 to 21 carbon atomsand that may have a substituent include a benzyl group, a diphenylmethylgroup, a 1,2-diphenylethyl group, a phenyl-cyclopentylmethyl group, anα-methylbenzyl group, a phenylethyl group, an α-methyl-phenylethylgroup, a β-methyl-phenylethyl group, a 3-phenylpropyl group, a3,3-diphenylpropyl group, a 4phenylbutyl group, a naphthylmethyl group,a stylyl group, a cynamyl group, a fluolenyl group, a1-benzocyclobutenyl group, a 1,2,3,4-tetrahydronaphthyl group, anindanyl group, a pyperonyl group, and a pyrenemethyl group; among these,the benzyl group, the phenyl-cyclopentylmethyl group, an α-methylbenzylgroup, the phenylethyl group, an α-methyl-phenylethyl group, theβ-methyl-phenylethyl group, the 3-phenylpropyl group, the 4-phenylbutylgroup, the stylyl group, the cynamyl group, the fluolenyl group, the1-benzocyclobutenyl group, and the 1,2,3,4-tetrahydronaphthyl group aremore preferable; and further, the benzyl group, an α-methylbenzyl group,the phenylethyl group, an α-methyl-phenylethyl group, theβ-methyl-phenylethyl group, the 3-phenylpropyl group, the stylyl group,the cynamyl group, the fluolenyl group, the 1-benzocyclobutenyl group,and the 1,2,3,4-tetrahydronaphthyl group are particularly preferable.

Preferable examples of the heterocycle which is formed by R¹ and R²together with a jointly bonded nitrogen atom include a 2-methylaziridinering, an azetizine ring, a pyrrolidine ring, a 3-pyrroline ring, apiperridine ring, a 1,2,3,6-tetrahydropiridine ring, ahexamethyleneimine ring, a piperadine ring, a1,3,3-trimethyl-6-azabicyclo[3,2,1]octane ring, a decahydroquinolinering, an oxazolidine ring, a morpholine ring, a thiazolidine ring, athiomorpholine ring, an indoline ring, an isoindoline ring, a1,2,3,4-tetrahydrocarbazole ring, a 1,2,3,4-tetrahydroquinoline ring, a1,2,3,4-tetrahydroisoquinoline ring, an iminodibenzyl ring, aphenoxadine ring, a phenothiadine ring, a phenadine ring, and the like;among them, the pyrrolidine ring, the 3-pyrroline ring, the piperridinering, the 1,2,3,6-tetrahydropiridine ring, the hexamethyleneimine ring,the piperadine ring, the decahydroquinoline ring, an oxazolidine ring,the morpholine ring, the thiazolidine ring, the thiomorpholine ring, andthe like are more preferable; and further, the pyrrolidine ring, the3-pyrroline ring, the piperridine ring, the 1,2,3,6-tetrahydropiridinering, the piperadine ring, the decahydroquinoline ring, an oxazolidinering, the morpholine ring, the thiazolidine ring, the thiomorpholinering, and the like are particularly preferable.

The group that is represented by R¹ and R² may include an ether group.Preferable examples of the group that is represented by R¹ and R² mayfurther include a tetrahydrofurfuryl group, a tetrahydropyranylmethylgroup, a 2,5-dihydro-2,5-dimethoxyfurfuryl group, and the like.

Preferable examples of the substituent of the alkyl group, the alkenylgroup, the aryl group, and the aralkyl group which are represented by R¹and R², as well as the substituent of the heterocycle which is formed byR¹ and R² together with a jointly bonded nitrogen atom in Formula (I)include an acyl group, an acetyl group, an acylamino group, anacylaminocarbonylamino group, an aralkylaminocarbonylamino group, anallylaminocarbonylamino group, a methacryloylaminocarbonylamino group, atrifluoromethyl group, a fluoro group, a chloro group, a bromo group, aniodo group, a hydroxy group, a nitro group, a methyl group, an ethylgroup, an n-propyl group, an i-propyl group, an n-butyl group, ani-butyl group, a sec-butyl group, a t-butyl group, a pentyl group, ahexyl group, a heptyl group, an octyl group, a vinyl group, a methoxygroup, an ethoxy group, a buthoxy group, an isopropoxy group, at-buthoxy group, a cyclohexyloxy group, a vinyloxy group, a methylthiogroup, an ethylthio group, a pirrolidinyl group, a pipelidinyl group, anamino group, a dimethylamino group, a diethylamino group, a phenylgroup, and the like; among these, the acyl group, the acetyl group, theacylamino group, the trifluoromethyl group, the fluoro group, the chlorogroup, the bromo group, the hydroxy group, the nitro group, the methylgroup, the ethyl group, the n-propyl group, the i-propyl group, then-butyl group, the i-butyl group, the sec-butyl group, the t-butylgroup, the pentyl group, the hexyl group, the vinyl group, the methoxygroup, the ethoxy group, the buthoxy group, the isopropoxy group, thet-buthoxy group, the cyclohexyloxy group, the vinyloxy group, themethylthio group, the ethylthio group, the pirrolidinyl group, thepipelidinyl group, the amino group, the dimethylamino group, thediethylamino group, the phenyl group, and the like are more preferable;and further the acyl group, the acetyl group, the acylamino group, thetrifluoromethyl group, the fluoro group, the chloro group, the bromogroup, the hydroxy group, the nitro group, the methyl group, the ethylgroup, the n-propyl group, the i-propyl group, the n-butyl group, thei-butyl group, the t-butyl group, the hexyl group, the vinyl group, themethoxy group, the ethoxy group, the isopropoxy group, the cyclohexyloxygroup, the vinyloxy group, the methylthio group, the ethylthio group,the pirrolidinyl group, the pipelidinyl group, the amino group, thedimethylamino group, the diethylamino group, the phenyl group, and thelike are particularly preferable.

These substituents may be further substituted by similar substituents.

In addition, when the substituent of R¹ and R², as well as thesubstituent of the above-mentioned heterocycles are specifically a grouphaving an active hydrogen, such as a hydroxy group or an amino group,they may be reacted with various acid chlorides, acid anhydrides,halides, or various isocyanates such that they are substituted by anacetyl group, an acyl group, (meth)acryloyl group, an alkylaminocarbonylgroup, an arylaminocarbonyl group (for example, a butylaminocarbonylgroup, a phenylaminocarbonyl group, and the like), an alkyl group, anaralkyl group, or the like.

In addition, the alkyl group, the alkenyl group, the aryl group, thearalkyl group, and the above-mentioned heterocycles may be furthersubstituted by a group which is similar to that represented by R¹ andR².

From the viewpoint of color value, a total molecular weight of the groupwhich is represented by R¹ and R² (a molecular weight as the sum of amolecular weight of R¹ and a molecular weight of R²) is preferably 500or less; is more preferably 400 or less; and is particularly preferably300 or less.

A total number of substituents which substitute R¹ and R² is preferably0 to 4; is more preferably 0 to 3; and is particularly preferably 0 to2.

The above-mentioned R³ represents a halogen atom, a trihalomethyl group,an alkoxy group having 1 to 21 carbon atoms, a nitro group, or an aminogroup. The amino group may have a substituent. n represents an integerof 0 to 4.

Preferable examples of R³ include a fluorine atom, a chlorine atom, abromine atom, a trifluoromethyl group, an alkoxy group having 1 to 15carbon atoms, a nitro group, and an amino group which may have asubstituent; among these, the fluorine atom, the chlorine atom, thetrifluoromethyl group, the alkoxy group having 1 to 10 carbon atoms, thenitro group, and the amino group which may have a substituent are morepreferable; and further, the chlorine atom, the trifluoromethyl group,the alkoxy group having 1 to 7 carbon atoms, the nitro group, and theamino group which may have a substituent are particularly preferable.

Preferable examples of the alkoxy group that has 1 to 21 carbon atomsand that is represented by R³ include an alkyloxy group, the alkylportion of which is an alkyl group which is similar to those describedas a preferable example of the alkyl group represented by R¹ or R².

Examples of the substituent which may substitute the amino grouprepresented by R³ include a group which is similar to those described asa substituent of the group represented by R¹ or R², and the preferableexamples thereof are similar.

n in Formula (I) is an integer that is preferably selected from 0 to 3,more preferably from 0 to 2, and particularly preferably from 0 to 1.

R⁴ in Formula (I) represents a halogen atom or an —SO₃M group.Preferable examples of R⁴ include a fluorine atom, a chlorine atom, abromine atom, and an —SO₃M group. More preferable examples of R⁴ includea fluorine atom, a chlorine atom, and an —SO₃M group; and particularlypreferable examples of R⁴ include a chlorine atom and an —SO₃M group.

M in Formula (I) represents a hydrogen atom, a cation of a metallic atomor a cation consisting of a nitrogen-containing compound. Among them,specific and preferable examples of M include a hydrogen atom, a cationof a metallic atom (such as a cation of Li, Na, K, Rb, Cs, Ag, Mg, Ca,Sr, Ba, Zn, Al, Ni, Cu, Co, or Fe), and a cation consisting of anitrogen-containing compound. More preferable examples of M include ahydrogen atom, a cation of Na, K, Rb, Cs, Ag, Mg, Ca, Sr, Ba, Zn, Al,Cu, or Fe, and a cation consisting of a nitrogen-containing compound.Particularly preferable examples of M include a hydrogen atom, a cationof Na, K, Mg, Ca, Ba, Sr, Zn, Al, Cu, or Fe, and a cation consisting ofa nitrogen-containing compound.

m in Formula (I) is an integer that is preferably selected from 0 to 4,and more preferably selected from 0 to 3.

A cation represented by the above-mentioned M that consists of anitrogen-containing compound is selected in consideration of all thefactors such as a solubility in organic solvent or water, salt formingproperties, absorbance/color value of the dye, and heat resistance andlight resistance as a colorant. When the selection is carried out onlyfrom the viewpoint of absorbance/color value, the nitrogen-containingcompound preferably has the lowest possible molecular weight.Specifically, a molecular weight of 300 or less is preferable; amolecular weight of 280 or less is more preferable; and a molecularweight of 250 or less is particularly preferable.

Specific examples of the cation consisting of the above-mentionednitrogen-containing compound will be mentioned below, but the cation isnot limited to these. The cation of the following nitrogen-containingcompounds is formed by protonation of the following.

From the viewpoints of light resistance, heat resistance, water orsolvent solubility, molar absorption coefficient, ease of synthesis, andthe like, the compounds which are represented by Formula (I) morepreferably have a structure as represented by the following Formulae(II), (III), and (IV).

In Formulae (II), (III), and (IV), R¹, R², R³, n, R⁴, and m representthe same meanings as in Formula (I), and the preferable ranges thereofare the same as given above. In Formula (IV), p represents an integer of0 to 3.

The following exemplary compounds (1) to (30) provide specific examplesof the compounds represented by Formula (I), but the present inventionis not limited to these.

The colorant represented by Formula (I) may be used in combination witha compound of the same species that is represented by Formula (I), andmay be simultaneously used with another colorant, a salt formed fromanother colorant and a metal or a nitrogen-containing compound, acomplex, a derivative of another colorant, or the like.

Examples of the another colorant include direct dyes, acidic dyes,mordant/acidic mordant dyes, basic dyes, vat dyes, sulfide dyes, azoicdyes, dispersed dyes, reactive dyes, fluorescent whitening agents, otherdyes, pigment resin colors, pigments, and the like which arecommonly-known, being given in Colour Index (Society of Dyes andColorists) and “Dyeing Note” (issued by Shikisensha Co., Ltd.).

Examples of these colorants include CI Solvent Blue 25, CI Solvent Blue55, CI Solvent Blue 67, CI Solvent Blue 38, CI Solvent Yellow 82, CISolvent Yellow 162, CI Solvent Orange 56, CI Acid Violet 17, CI AcidViolet 49, CI Direct Blue 86 and the like, and these may be used aloneor in mixture of two or more, respectively.

Acidic Dyes

Here is a description about the above-mentioned acidic dyes. The acidicdyes are not particularly limited, provided that they have an acidgroup, such as the sulfonic acid group or the carboxylic acid group, butan appropriate one of them is selected in consideration of all thenecessary performances, such as a solubility in organic solvent anddeveloping solution, a salt formability, an absorbance, an interactionwith other components in the curable composition, a light resistance,and a heat resistance.

Specific examples of the above-mentioned acidic dyes are given below,but not limited to these. The examples include: acid alizarin violet N;acid black 1, 2, 24 or 48; acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29,40, 45, 62, 70, 74, 80, 83, 86, 87, 90, 92, 103, 108, 112, 113, 120,129, 138, 147, 158, 171, 182, 192, or 249; acid chrome violet K; acidFuchsin; acid green 1, 3, 5, 9, 16, 25, 27, or 50; acid orange 6, 7, 8,10, 12, 50, 51, 52, 56, 63, 74, or 95; acid red 1, 4, 8, 14, 17, 18, 26,27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91,92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158,176, 183, 198, 211, 215, 216, 217, 249, 252, 257, 260, 266, or 274; acidviolet 6B, 7, 9, 17, or 19; acid yellow 1, 3, 7, 9, 11, 17, 23, 25, 29,34, 36, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 114, 116, 169,or 243; Food Yellow 3; and derivatives of these dyes.

Among these, as the above-mentioned acidic dyes, the dyes, such as: acidblack 24; acid blue 7, 23, 25, 29, 62, 83, 86, 87, 90, 92, 108, 138,158, or 249; acid green 3, 5, 9, 16, 25, 27, or 50; acid orange 8, 51,56, 74, 63, or 74; acid red 1, 4, 8, 34, 37, 42, 52, 57, 80, 97, 114,143, 145, 151, 183, or 217; acid violet 7; acid yellow 17, 23, 25, 29,34, 40, 42, 72, 76, 99, 111, 112, 114, 116, 169, 243; Food Yellow 3; andderivatives of these dyes are preferable.

In addition, azo, xanthene, and phthalocyanine acidic dyes other thanthose mentioned above are preferable, and the acidic dyes, such as CISolvent Blue 44 or 38; CI Solvent Orange 45, Rhodamine B; Rhodamine 110;and 2,7-naphthalenedisufonic acid,3-[(5-chloro-2-phenoxyphenyl)hydrazono]-3,4-dihydro4-oxo-5-[(phenylsulfonyl)amino]-2,7-naphthalenedisufonicacid, and the derivatives of these dyes are preferably used.

As the derivatives of the above-mentioned acidic dyes, compounds whichare produced by converting the sulfonic acid of the acidic dyes into asulfonamide or a sulfonate, and the like can be effectively used.

Atomic Group that Form Salts with Acidic Dyes

For the atomic group for forming a salt with the above-mentioned acidicdyes, there is no limitation, provided that the atomic group is acationic one which forms a salt with the anion of the above-mentionedacidic dyes. Examples of such an atomic group include cations consistingof Li, Na, K, Rb, Cs, Ag, Mg, Ca, Sr, Ba, Zn, Al, Ni, Cu, Co, Fe, or anitrogen-containing compound, and the like.

Here is a description of the nitrogen-containing compounds for forming asalt with the above-mentioned acidic dyes. In the present invention, thenitrogen-containing compound which forms a salt with the acidic dyes isselected by consideration of all the factors, such as the solubility inorganic solvent and developing solution, the salt forming properties,the absorbance of the dye, and the interaction with other components inthe curable composition. When the selection is carried out only from theviewpoint of absorbance, the above-mentioned nitrogen-containingcompound preferably has the lowest possible molecular weight.Specifically, a molecular weight of 245 or less is preferable; amolecular weight of 240 or less is more preferable; and a molecularweight of 230 or less is particularly preferable.

In order to prevent photofading and improve the heat resistance of thedye, generally known nitrogen-containing color fading inhibitorcompounds may be used. From this viewpoint, a compound having a lowoxidation potential (a low ionization potential), a tertiary aminecompound, an aliphatic cyclic amine compound, an aniline compound, ahydrazine compound, and the like are preferable.

The preferable specific examples of the nitrogen-containing compound arethe same as those mentioned as M of the —SO₃M in the description of R⁴of the above-mentioned Formula (I).

Molar ratio (L) between the atomic group forming a salt with a compoundof the Formula (I) (or an acidic dye) and the compound of the Formula(I) (or the acidic dye)

Here is an explanation of the ratio between the number of moles of anatomic group which forms a salt with a compound of the Formula (I) (oran acidic dye) and the number of moles of the compound of the Formula(I) (or the acidic dye) (hereinafter the ratio may be referred to as“L”). The above-mentioned L is a value determining the ratio of themoles of the acidic dye molecules to the moles of the atomic group,which is its counter ion, and can be freely selected in accordance withthe salt forming conditions of the acidic dye and atomic group.Specifically, the L is a numerical value in a range of 0<L≦10, and isthe number of acid functional groups in the acidic dye. It is selectedin consideration of all the factors, such as the solubility in organicsolvent and developing solution, the salt forming properties, theabsorbance, the interaction with other components in the curablecomposition, the light resistance, and the heat resistance. When theselection is carried out only from the viewpoint of absorbance, it ispreferable for the above-mentioned L to take a numerical value of 0<L≦7;it is more preferable for the above-mentioned L to take a numericalvalue of 0<L≦6; and it is particularly preferable for theabove-mentioned L to take a numerical value of 0<L≦5.

Concentration Used

Here is an explanation of the concentration used of the compoundrepresented by the Formula (I) (when another dye, such as an acidic dye,is used in conjunction then it is included). The concentration of thecompound represented by the Formula (I) (when the above-mentioned acidicdye is used in conjunction then it is included) in the total solidcontent of the colorant-containing curable composition of the presentinvention varies depending upon the species of the dye. However, fromthe viewpoints of curability, developability, pattern configuration, andcolor intermingling, 0.5 to 80% by mass is preferable; 0.5 to 60% bymass is more preferable; and 0.5 to 50% by mass is particularlypreferable.

Binder

The binder used in the present invention is not particularly limited,provided that it is alkali soluble, however, it is preferable to selectthe binder from the viewpoints of heat resistance, developability,availability, and the like.

As the alkali soluble binder, a binder which is a linear high polymericorganic substance, is soluble in organic solvent, and can be processedfor developement with a weak alkali aqueous solution is preferable.Examples of such a linear high polymeric organic substance includepolymers which have carboxylic acid in its side chain, such as themethacrylic acid copolymer, the acrylic acid copolymer, the itaconicacid copolymer, the crotonic acid copolymer, the maleic acid copolymer,the partially esterified maleic acid copolymer, and the like asdisclosed in, for example, Japanese Patent Application Laid-pen (JP-A)Nos. 59-44615, 54-34327, 58-12577, 54-25957, 59-53836, and 59-71048.Similarly, acidic cellulose derivatives which have carboxylic acid inits side chain are useful. In addition to these, a polymer with ahydroxyl group to which an acid anhydride is added, polyhydroxystyreneresins, polysiloxan resins, poly(2-hydroxyethyl(meth)acrylate),polyvinyl pyrrolidone, polyethylene oxide, polyvinyl alcohol, and thelike are also useful.

The above-mentioned alkali soluble binder may be a copolymer of monomershaving a hydrophilic property, which examples include alcoxyalkyl(meth)acrylate, hydroxyalkyl (meth)acrylate, glycerol (meth)acrylate,(meth)acrylamide, N-methylol acrylamide, secondary or tertiaryalkylacrylamide, dialkylaminoalkyl (meth)acrylate, morpholine(meth)acrylate, N-vinyl pirrolidone, N-vinyl caprolactam, vinylimidazole, vinyl triazole, methyl (meth)acrylate, ethyl (meth)acrylate,branched or straight-chain propyl (meth)acrylate, branched orstraight-chain butyl (meth)acrylate, andphenoxyhydroxypropyl(meth)acrylate, and the like.

As other monomers having a hydrophilic property, monomers and the likeincluding a tetrahydrofurfuryl group, phosphoric acid, phosphate ester,quarternary ammonium salt, ethyleneoxy chain, propyleneoxy chain,sulfonic acid and its salt, morpholinoethyl group, and the like are alsouseful.

Further, in view of improving a crosslinking efficiency, a polymerizablegroup may be included in the side chain, and polymers and the like whichcontain an allyl group, a (meta)acryl group, an allyloxyalkyl group, orthe like in the side chain thereof are also useful. Examples of thepolymers containing these polymerizable groups are given below, but notlimited to these, provided that an alkali soluble group, such as a —COOHgroup, a —OH group, and an ammonium group, and a carbon-carbonunsaturated bond, are included therein.

For example, a compound which is obtained by reacting a compound havingan epoxy ring, which has a reactivity with a —OH group, and a compoundhaving a carbon-carbon unsaturated bond group, such as glycidylacrylate, with a copolymer which is composed of a monomer having a —OHgroup, such as 2-hydroxyethylacrylate, a monomer having a —COOH group,such as methacrylic acid, and a monomer which is copolymerizable withthe monomer having a —OH group and the monomer having a —COOH group,such as an acryl compound, a vinyl compound or the like, can be used.For the reaction with the —OH group, a compound having an acidanhydride, an isocyanate group, and an acryloyl group can be used inplace of the epoxy ring. Further, a reaction product which is obtainedby reacting a saturated- or unsaturated-polybasic acid anhydride with acompound obtained by reacting a compound having an epoxy ring with anunsaturated carboxylic acid, such as acrylic acid, as disclosed inJapanese Patent Application Laid-)pen (JP-A) No. 6-102669 and 6-1938 canalso be used.

Examples of a compound which has both an alkali soluble group, such as a—COOH group, and a carbon-to-carbon unsaturated group include DIANAL NRseries (trade name, manufactured by Mitsubishi Rayon Co., Ltd.), —COOHgroup containing polyurethane acrylic oligomer (trade name: PHOTOMER6173, manufactured by Diamond Shamlock Co., Ltd.), VISCOTE R-264 and KSRESIST 106 (both trade names, manufactured by Osaka Organic ChemicalIndustry Ltd.), CYCLOMER P series and PRAXEL CF200 series (both tradenames, manufactured by Daicel Company Ltd.), EBECRYL 3800 (trade name,manufactured by Daicel-UCB Company Ltd.), and the like.

Among these various kinds of binders, preferable examples of the alkalisoluble binder to be used in the present invention from the viewpoint ofheat resistance include a polyhydroxystyrene resin, polysiloxane resin,(meth)acryl resin, acrylamide resin, and acryl/acrylamide copolymerresin, and particularly preferable examples (meth)acryl resin,polyhydroxystyrene resin, and polysiloxane resin of the alkali solublebinder to be used in the present invention. In addition, from theviewpoint of control of developability, a (meth)acryl resin, acrylamideresin, and acryl/acrylamide copolymer resin are preferable. As the(meth)acrylic resin, a copolymer consisting of monomers selected from abenzyl(meth)acrylate, (meth)acryl acid, hydroxyethyl(meth)acrylate,(meth)acrylamide and the like, (meth)acrylic resins having apolymerizable side-chain, such as CYCLOMER P series, PRAXEL CF200 series(both trade names, manufactured by Daicel Company Ltd.), EBECRYL 3800(trade name, manufactured by Daicel-UCB Company Ltd.), DIANAL NR series(trade name, manufactured by Mitsubishi Rayon Co., Ltd.), VISCOTE R264,KS RESIST 106 (both trade names, manufactured by Osaka Organic ChemicalIndustry Ltd.), or the like are preferable.

In addition, in view of enhancing a strength of a cured film,alcohol-soluble nylon, polyether formed from2,2-bis-4-hydroxyphenyl)-propane and epichlorhydrine, and the like arealso useful.

In addition, examples of the binder to be used in the present inventioninclude an alkali soluble phenolic resin. The alkali soluble phenolicresin can be preferably used when the composition of the presentinvention is rendered to be a positive composition. Examples of thealkali soluble phenolic resin include a novolak resin, a vinylcopolymer, and the like.

Examples of the novolak resin include a novolak resin which is obtainedby condensing phenols and aldehydes in the presence of an acidiccatalyst. Examples of the phenols include a phenol, crezol, ethylphenol, butyl phenol, xylenol, phenyl phenol, catechol, rezorcinol,pyrogallol, naphthol, bisphenol A, and the like. The phenols can be usedalone or in combination of two or more of them. Examples of thealdehydes include a formaldehyde, paraformaldehyde, acetaldehyde,propyonic aldehyde, benzaldehyde, and the like.

Specific examples of the novolak resin include a condensation product ofa metacrezol, paracrezol, or a mixture of these and formalin. Amolecular weight distribution of the novolak resin may be adjusted bymeans such as fractionation. In addition, a low-molecular weightcomponent having a phenolic hydroxyl group, such as bisphenol C orbisphenol A, may be mixed with the above-mentioned novolak resin.

From the viewpoint of developability, liquid viscosity, and the like,the binder is preferably a copolymer having a weight average molecularweight (a polystyrene-converted value measured by the GPC method) of1,000 to 2×10⁵, more preferably of 2,000 to 1×10⁵; and particularlypreferably of 3,000 to 5×10⁴.

From the viewpoint of a developability and the like, an amount of thebinder which is used in the composition of the present invention ispreferably in a range from 10 to 90% by mass, more preferably in a rangefrom 20 to 80% by mass; and particularly preferably in a range from 30to 70% by mass relative to the total solid content in the composition ofthe present invention.

Crosslinking Agent

Next, the crosslinking agent will be described. The present inventionmainly use the compound (dye) represented by Formula (I) in order toprogress a film curing reaction to a high degree as compared toconventional ones to provide a film having a good curability, however,it is also possible to additionally use a crosslinking agent forobtaining a film which is cured to a still higher degree. Thecrosslinking agent that can be used in the present invention is notparticularly limited, provided that it allows crosslinking reaction forfilm curing to be carried out, however, preferable examples thereofinclude: (a) a epoxy resin; (b) a melamine compound, guanamine compound,glycol uryl compound, or urea compound which is substituted by at leastone substituent selected from the group consisting of a methylol group,an alkoxymethyl group and an acyloxymethyl group; (c) a phenoliccompound, a naphtholic compound, or a hydroxyanthracene compound whichis substituted by at least one substituent selected from the groupconsisting of a methylol group, an alkoxymethyl group and anacyloxymethyl group. Among them, a multifunctional epoxy resin isparticularly preferable as the crosslinking agent.

As the (a) epoxy resin, any compounds can be used with no particularrestrictions, provided that they have an epoxy group andcrosslikability. Examples of these compounds include: low-molecularweight compounds containing a divalent glyidyl group, such asbisphenol-A-diglycidylether, ethyleneglycol diglycidylether, butanedioldiglycidylether, hexanediol diglycidylether, dihydroxybiphenyldiglycidylether, phthalic acid diglycidylether, or N,N-diglycidylaniline; low-molecular weight compounds containing a trivalent glyidylgroup, represented by trimethylolpropane triglycidylether,trimethylolphenol triglycidylether, TRISP-PA (trade name, manufacturedby Honshu Chemical Industry Co., Ltd.)-triglycidylether, or the like;low-molecular weight compounds containing a tetravalent glycidyl group,represented by pentaerythritol tetraglycidylether, tetramethylolbisphenol-A-tetraglycidylether, or the like; polyvalent low-molecularweight compounds containing a polyvalent glycidyl group, such asdipentaerythritol pentaglycidylether, dipentaerythritolhexaglycidylether, or the like; high-molecular weight compoundscontaining a glycidyl group, represented by polyglycidyl (meth)acrylate,a 1,2-epoxy-4-(2-oxylanyl) cyclohexane addition product of2,2-bis(hydroxymethyl)-1-butanol, or the like.

With regard to a number of the methylol group, alkoxymethyl group oracyloxymethyl group which substitutes the (b) compound, the melaminecompound is substituted with 2 to 6 of these substituents, and each ofthe glycoluryl compound, the guanamine compound, and the urea compoundis substituted with 2 to 4 of these substituents. It is preferable thatthe melamine compound is substituted with 5 to 6 of these substituents,and each of the glycoluryl compound, the guanamine compound, and theurea compound is substituted with 3 to 4.

These methylol-group containing compounds can be obtained by heating thealkoxymethyl-group containing compounds in the presence of an acidiccatalyst, such as hydrochloric acid, sulfuric acid, nitric acid, ormethansulfonic acid, in alcohol. The acyloxymethyl-group containingcompound can be obtained by mixing a methylol-group containing compoundwith acylchloride and mixing them by stirring in the presence of a basiccatalyst.

Hereinafter, specific examples of the (b) compound having substituentsare mentioned.

Examples of the melamine compound include a hexamethylol melamine,hexamethoxymethyl melamine, compounds in which 1 to 5 methylol groups ofhexamethylol melamine are methoxymethylized or mixtures thereof,hexamethoxyethyl melamine, hexaacyloxymethyl melamine, compounds inwhich 1 to 5 methylol groups of hexamethylol melamine areacyloxymethylized or mixtures thereof, and the like.

Examples of the guanamine compound include tetramethylol guanamine,tetramethoxymethyl guanamine, compounds in which 1 to 3 methylol groupsof tetramethylol guanamine are methoxymethylized or mixtures thereof,tetramethoxyethyl guanamine, tetraacyloxymethyl guanamine, compounds inwhich 1 to 3 methylol groups of tetramethylol guanamine areacyloxymethylized or mixtures thereof, and the like.

Examples of the glycoluryl compound include tetramethylol glycoluryl,tetramethoxymethyl glycoluryl, compounds in which 1 to 3 methylol groupsof tetramethylol glycoluryl are methoxymethylized or mixtures thereof,compounds in which 1 to 3 methylol groups of tetramethylol glycolurylare acyloxymethylized or mixtures thereof, and the like.

Examples of the urea compound include tetramethylol urea,tetramethoxymethyl urea, compounds in which 1 to 3 methylol groups oftetramethylol urea are methoxymethylized or mixtures thereof,tetramethoxyethyl urea, and the like. These may be used alone or incombination of two or more thereof.

The phenolic compound, naphtholic compound, and hydroxyanthracenecompound which are categorized as the (c) compound, being substituted byat least one substituent selected from the group consisting of themethylol group, alkoxymethyl group, and acyloxymethyl group suppressintermixing with an overcoated photoresist by a thermal crosslinking,and further enhance a film strength, as are the case with the (b)compound.

It is necessary that one molecule of the compound (c) includes at leasttwo groups of those selected from the group consisting of the methylolgroups, alkoxymethyl groups and acyloxymethyl groups. From theviewpoints of thermal crosslinkability and storage stability, it ispreferable that the compound (c) is a phenolic compound in which all ofthe second and fourth positions are substituted.

Further, it is preferable that the naphtholic compound and thehydroxyanthracene compound, which becomes a skeleton of the compound(c), is substituted at all the ortho and para positions thereof by —OHgroups.

The third or fifth position of the phenolic compound, which provides askeleton of the compound (c), may be substituted or unsubstituted. Withregard to the naphtholic compound, which provides the skeleton of thecompound (c), the positions other than the ortho positions of —OH groupsmay be substituted or unsubstituted.

The methylol-group containing compounds can be obtained by using acompound with which the ortho or para position (the second or fourthposition) relative to the phenolic —OH group is a hydrogen atom as a rawmaterial, and causing it to react with formalin in a presence of a basiccatalyst, such as sodium hydroxide, potassium hydroxide, ammonia, ortetraalkyl ammonium hydroxide.

In addition, the alkoxymethyl-group containing compounds can be obtainedby heating the methylol-group containing compounds in a presence of anacidic catalyst, such as hydrochloric acid, sulfuric acid, nitric acid,or methansulfonic acid, in alcohol.

The acyloxymethyl-group containing compounds can be obtained by causingthe methyrol-group containing compounds to react with acylchloride in apresence of a basic catalyst.

Examples of the skeleton compound include a phenolic compound, naphthol,and a hydroxyanthracen compound in which ortho or para positionsrelative to a phenolic —OH group thereof is unsubstituted, and specificexamples thereof include a phenol, crezol, isomers thereof, 2,3-xylenol,2,5-xylenol, 3,4-xylenol, 3,5-xylenol, bisphenols such as bisphenol-A,4,4′-bishydroxybiphenyl, TRIS P-PA (described above), naphthol,dihydroxynaphthalen, 2,7-dihydroxyanthracen and the like.

Specific examples of the (c) compound include a trimethylol phenol,tri(methoxymethyl)phenol, trimethylol phenol, compounds in which 1 or 2methylol groups of trimethylol phenol are methoxymethylized,trimethylol-3-crezol, tri(methoxymethyl)-3-crezol, compounds in which 1or 2 methylol groups of trimethylol-3-crezol are methoxymethylized,dimethylol crezols such as 2,6dimethylol-4-crezol, tetramethylolbisphenol-A, tetramethoxymethyl bisphenol-A, compounds in which 1 to 3methylol groups of tetramethylol bisphenol-A are methoxymethylized,tetramethylol-4,4′-bishydroxybiphenyl,tetramethoxymethyl-4,4-bishydroxybiphenyl, hexamethylol species ofTRISP-PA (described above), hexamethoxymethyl species TRIS P-PA(described above), compounds in which 1 to 5 methylol groups ofhexamethylol species of TRIS P-PA (described above) aremethoxymethylized, bishydroxymethyl naphthalenediol, and the like.

Examples of the hydroxyanthracen compound include a1,6-dihydroxymethyl-2,7-dihydroxyanthracen, and the like.

Examples of the acyloxymethyl-group containing compounds includecompounds in which a part or all of the methylol groups of themethylol-group containing compounds are acyloxymethylized.

Among these compounds, a trimethylol phenol, bishydroxymethyl-crezol,tetramethylol bisphenol-A, hexamethylol species of TRIS P-PA (describedabove), or phenolic compounds in which the hexamethylol groups of thesecompounds are substituted by an alkoxymethyl group and both a methylolgroup and an alkoxymethyl group.

These may be used alone or in combination of two or more thereof.

The content of the compounds (a) to (c) in the colorant-containingcurable composition of the present invention varies depending upon thebase material, however, from the viewpoints of curability, spectralcharacteristic, and the like, it is preferably in a range of 1 to 70% bymass, more preferably in a range of 5 to 50% by mass, and particularlypreferably in a range of 7 to 30% by mass with respect to the solidcontent in the composition.

Monomer

Next, the polymerizable compound (hereinafter referred to as “monomer”)to be contained when the composition of the present invention is ofnegative composition will be described. As the monomer, a compound whichhas at least one addition-polymerizable ethylene group, has a boilingpoint of 100° C. or higher under normal pressure, and has an ethylenicunsaturated group, is preferable. Examples thereof include:monofunctional acrylates and methacrylates such as polyethylene glycolmono(meth)acrylate, polypropylene glycol mono(meth)acrylate,phenoxyethyl (meth)acrylate; polyethylene glycol di(meth)acrylates;trimethylol ethane tri(meth)acrylates; neopentyl glycoldi(meth)acrylates; pentaerythritol tri(meth)acrylates; pentaerythritoltetra(meth)acrylates; dipentaerythritol penta(meth)acrylates;dipentaerythritol hexa(meth)acrylates; hexanediol (meth)acrylates;trimethylol propane tri(acryloyloxypropyl) ether;tri(acryloyloxyethyl)isocyanulate; compounds obtained by adding ethyleneoxides, propylene oxides or the like to multifunctional alcohols, suchas glycerin or trimethylol ethane, and then (meth)acrylating theresultant of the reaction; urethane acrylates such as those disclosed inJapanese Patent Application Publication (JP-B) Nos. 48-41708 and 50-6034or Japanese Patent Application Laid-)pen (JP-A) No. 51-37193; polyesteracrylates such as those disclosed in Japanese Patent ApplicationLaid-Open (JP-A) No. 48-64183, Japanese Patent Application Publication(JP-B) Nos. 49-43191 and 52-30490; and multifunctional acrylates ormethacrylates, such as epoxyacrylates, which are reaction products ofepoxy resins and (metha)acrylic acids, and mixtures thereof. Further,examples thereof includes those introduced as light curable monomers andoligomers in Journal of the Adhesion Society of Japan, Vol. 20, No. 7,pp. 300 to 308.

As the above-mentioned monomer, the (meth)acrylic ester monomer ispreferable, and the quadrifunctional or higher (meth)acrylic estermonomer is particularly preferable.

From the viewpoint of curability and the like, the content of theabove-mentioned monomer in the composition of the present invention ispreferably 0.1 to 90% by mass, more preferably 1.0 to 80% by mass, andparticularly preferably 2.0 to 70% by mass with respect to the solidcontent of the composition.

Photopolymerization Initiator

Next, the photopolymerization initiator to be contained when thecomposition of the present invention is a negative composition will bedescribed. The photopolymerization initiator is not particularlylimited, provided that it allows the monomers having polymerizability tobe polymerized, however, it is preferable that the photopolymerizationinitiator is selected from the viewpoints of characteristics, initiationefficiency, absorption wavelength, availability, cost, and the like.

Examples of the photopolymerization initiator include atrihalomethyltriazine compound, a benzyldimethylketal compound, an aα-hydroxyketone compound, an α-aminoketone compound, a phosphine oxidecompound, a metalocen compound, an oxime compound, a triallyl imidazoledimer, a benzothiazole compound, a benzophenone compound, anacetophenone compound and its derivative, acyclopentadienbenzene-ferrous complex and its salt, ahalomethyloxadiazole compound, and a 3-aryl-substituted coumarincompound, and the like, and the photopolymerization initiator preferablycomprises at least one kind of compound selected from the groupconsisting of the α-aminoketone compound, the phosphine oxide compound,the metalocen compound, the oxime compound, and the triallyl imidazoledimer.

In addition, it is preferable that the photopolymerization initiator isa compound which does not generate an acid by decomposition.

Examples of the active halogen compound, such as the above-mentionedhalomethyloxadiazole compound, include2-halomethyl-5-vinyl-1,3,4-oxadiazole compound and the like as disclosedin Japanese Patent Application Publication (JP-B) No. 57-6069,2-trichloromethyl-5-styryl-1,3,4-oxadiazole,2-trichloromethyl-5-(p-cyanostyryl)-1,3,4-oxadiazole,2-trichloromethyl-5-(p-methoxystyryl)-1,3,4-oxadiazole, and the like.

Examples of the trihalomethyl-s-triazine compound photopolymerizationinitiator include vinyl-halomethyl-s-triazine compounds as disclosed inJapanese Patent Application Publication (JP-B) No. 59-1281,2-naphtho-1-yl)-4,6bis-halomethyl-s-triazine compounds and4-(p-aminophenyl)-2,6-di- halomethyl-s-triazine compounds as disclosedin Japanese Patent Application Laid-pen (JP-A)No. 53-133428, and thelike.

Other examples thereof include a2,4bis(trichloromethyl)-6-p-methoxystyryl-s-triazine,2,6bis(trichloromethyl)-4-(3,4-methylenedioxyphenyl)-1,3,5triazine,2,6-bis(trichloromethyl)-4-4-(methylphenyl)-1,3,5-triazine,2,4-bis(trichloromethyl)-6-(1-p-dimethylaminophenyl-1,3-butadienyl)-s-triazine,2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine,2-(naphtho-1-yl)-4,6-bis-trichloromethyl-s-triazine,2-(4-ethoxy-naphtho-1-yl)-4,6-bis-trichloromethyl-s-triazine,2-[4buthoxy-naphtho-1-yl]-4,6-bis-trichloromethyl-s-triazine,2-[4-2-methoxyethyl)-naphtho-1-yl]-4,6bis-trichloromethyl-s-triazine,2-[4-2-ethoxyethyl)-naphtho-1-yl]-4,6-bis-trichloromethyls-triazine,2-[4-2-buthoxyethyl)-naphtho-1-yl]-4,6-bis-trichloromethyl-s-triazine,2-(2-methoxy-naphtho-1-yl)-4,6-bis-trichloromethyl-s-triazine,2-(6-methoxy-5-methyl -naphtho-2-yl)-4,6-bis-trichloromethyl-s-triazine,2-(6-methoxy-naphtho-2-yl)-4,6-bis-trichloromethyl-s-triazine,2-(5-methoxy-naphtho-1-yl)-4,6-bis-trichloromethyl-s-triazine,2-(4,7-dimethoxy-naphtho-1-yl)-4,6-bis-trichloromethyl-s-triazine,

2-(6-ethoxy-naphtho-2-yl)-4,6-bis-trichloromethyl-s-triazine,2-(4,5-dimethoxy-naphtho-1-yl)-4,6-bis-dichloromethyl-s-triazine,4-[p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-methyl-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6di(trichloromethyl)-s-triazine,4-[p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-methyl-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-(p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-[p-N,N-di(phenyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-(p-N-chloroethylcarbonylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-[p-N-(p-methoxyphenyl)carbonylaminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[m-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[m-bromo-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)s-triazine,4-[m-chloro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6di(trichloromethyl)-s-triazine,4-[m-fluoro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,

4-[o-bromo-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-chloro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-fluoro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-bromo-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-chloro-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[o-fluoro-p-N,N-i(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[m-bromo-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,4-[m-chloro-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazine,

4-[m-fluoro-p-N,N-di(chloroethyl)aminophenyl]-2,6di(trichloromethyl)-s-triazine,4-m-bromo-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(m-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-m-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6di(trichloromethyl)-s-triazine,4-(o-bromo-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(o-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(o-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(m-bromo-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(m-chloro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(m-fluoro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(o-bromo-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(o-chloro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,4-(o-fluoro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazine,and the like.

In addition to these, TAZ series manufactured by Midori Kagaku Co.,Ltd., including TAZ-107, TAZ-110, TAZ-104, TAZ-109, TAZ-140, TAZ-204,TAZ-113, TAZ-123, and TAZ-104 (all trade names, manufactured by MidoriKagaku Co., Ltd.); T series manufactured by Panchim Ltd., includingT-OMS, T-BMP, T-R, and T-B (all trade names, manufactured by PanchimLtd.); IRGACURE® series manufactured by Ciba Specialty Chemicals Inc.,including IRGACURE® 651, IRGACURE® 184, IRGACURE® 500, IRGACURE® 1000,IRGACURE® 149, IRGACURE® 819, and IRGACURE® 261; DAROCUR® seriesmanufactured by Ciba Specialty Chemicals Inc., including DAROCUR® 11734;4′-bis(diethylamino)benzophenone,2-(o-benzoyloxime)-[4-phenylthio)phenyl]-1,2-octanedione,2benzyl-2-dimethylamino-4-morpholinobuthylophenone,2,2-dimethoxy-2-phenylacetophenone,2-(o-chlorphenyl)-4,5-diphenylimidazolyl dimer,2-(o-fluorophenyl)-4,5-diphenylimidazolyl dimer, dimer,2-p-methoxyphenyl)-4,5-diphenylimidazolyl dimer,2-p-dimethoxyphenyl)-4,5-diphenylimidazolyl dimer,2-2,4-dimethoxyphenyl)-4,5-diphenylimidazolyl dimer,2-(p-methylmercaptophenyl)-4,5-diphenylimidazolyl dimer,benzoinisopropylether, and the like can be usefully used.

Examples of the α-aminoketone compound include IRGACURE® seriesmanufactured by Ciba Specialty Chemicals Inc. (such as IRGACURE® 907 orIRGACURE® 369), 2-methyl-1-phenyl-2-morpholinopropane-1-on,2-methyl-1-[4-(hexyl)phenyl]-2-morpholinopropane-1-on,2-ethyl-2-dimethylamino-1-(4-morpholinophenyl)butanone-1, and the like.

The oxime compound is nor particularly limited, however, preferableexamples include2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl)-1,2-octanedione,1-(4-methylsulfanyl-phenyl)butane-1,2-butane-2oxime-O-acetate,1-(4-methylsulfanyl-phenyl)-butane-1-onoxime-O-acetate,hydroxyimino-(4-methylsulfanyl-phenyl)-acetic acid ethylester-O-acetate, hydroxyimino-4-(methylsulfanyl-phenyl)-acetic acidethyl ester-O-benzoate, and the like.

In addition, regarding other photopolymerization initiators, preferableexamples of the benzylmethylketal compound include IRGACURE® 651; thoseof the α-hydroxyketone compound include IRGACURE® 184, IRGACURE® 1173,IRGACURE-® 500, IRGACURE® 1000, and IRGACURE® 2959; those of theα-aminoketone compound include IRGACURE® 907 and IRGACURE® 369; those ofthe phosphine oxide compound (blend) include IRGACURE® 1700, IRGACURE®149, IRGACURE® 1850, IRGACURE® 819, and IRGACURE® 814; those of themetalocen compound include IRGACURE® 784 and IRGACURE® 261 (allmanufactured by Ciba Specialty Chemicals Inc.), from the viewpoints ofavailability and stability, and the analogs/peripheral compounds forthese, and the like are also preferable.

As described above, from the viewpoints of light resistance and heatresistance of the dye, it is preferable to use a compound which does notgenerate an acid by decomposition. Namely, it is preferable to use atleast one kind of compound selected from the group consisting of abenzylmethylketal compound, an α-hydroxyketone compound, anα-aminoketone compound, a phosphine oxide compound, a metalocencompound, an oxime compound, a triallylimidazole dimer, a benzothiazolecompound, a benzophenone compound, a acetophenone compound and itsderivative, and a cyclopentadienebenzene-ferrous complex and its salt asthe compound which does not generate an acid by decomposition. It isfurther preferable to use at least one kind of compound selected fromthe group consisting of an α-aminoketone compound, a phosphine oxidecompound, a metalocen compound, an oxime compound, and atriallylimidazole dimer.

These photopolymerization initiators can be used in combination withsensitizers and light stabilizers.

Specific examples of the sensitizers and light stabilizers include:benzoin, benzoinmethylether, 9-fluorenone, 2-chloro-9-fluorenone,2-methyl-9-fluorenone, 9-anthrone, 2bromo-9-anthrone,2-ethyl-9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone,2-t-butyl-9,10-anthraquinone, 2,6-dichloro-9,10-anthraquinone, xanthone,2-methylxanthone, 2-methoxyxanthone, 2-methoxyxanthone, thioxanthone,2,4-diethylthioxanthone, acridone, 10-butyl-2-chloroacridone, benzyl,dibenzalacetone, p-dimethylamino)phenylstyrylketone,p-dimethylamino)phenyl-p-methylstyrylketone, benzophenone,p-(dimethylamino)benzophenone(or Michler's ketone),p-dimethylamino)benzophenone, benzoanthron, and the like; benzothiazolecompounds and the like as disclosed in Japanese Patent ApplicationPublication (JP-B) No. 51-48516; TINUVIN® 1130 and TINUVIN® 400 (bothmanufactured by Ciba Specialty Chemicals); and the like.

In addition to the above-mentioned photopolymerization initiators,commonly-known photopolymerization initiators can be used in thecomposition of the present invention.

Specific examples thereof include vicinalpolyketolaldonyl compounds asdisclosed in U.S. Pat. No. 2,367,660; α-carbonyl compounds as disclosedin U.S. Pat. Nos. 2,367,661 and 2,367,670; acyloinethers as disclosed inU.S. Pat. No. 2,448,828; aromatic acyloin compounds substituted byα-hydrocarbon groups as disclosed in U.S. Pat. No. 2,722,512; multicorequinone compounds as disclosed in U.S. Pat. Nos. 3,046,127 and2,951,758; combinations of triallylimidazole dimers andpaminophenylketones as disclosed in U.S. Pat. No. 3,549,367;benzothiazole compounds and trihalomethyl-s-triazine compounds asdisclosed in Japanese Patent Application Publication (JP-B) No.51-48516, and the like.

The amount used of the above-mentioned photopolymerization initiator ispreferably 0.01 to 50% by mass, more preferably 1 to 30% by mass, andparticularly preferably 1 to 20% by mass with respect to the monomersolid content. When the amount used of the photopolymerization initiatoris within the range of 0.01 to 50% by mass, the film strength can beprevented from being weakened for too low molecular weight.

A thermal polymerization inhibitor is preferably added to thecomposition of the present invention.

Examples of the thermal polymerization inhibitor include hydroquinone,p-methoxyphenol, di-t-butyl-p-crezol, pirrogalol, t-butylcatechol,benzoquinone, 4,4′-thiobis(3-methyl-6-t-butylphenol),2,2′-methylenebis(4-methyl-6t-butylphenol), 2-mercaptobenzoimidazole,and the like.

Solvent

The solvent to be used with the present invention is not basicallyparticularly limited, provided that the requirements for solubility andcoatability of the composition are met, however, it is preferable thatthe solvent is selected in consideration of the solubility, coatability,and safety of dyes and binders.

Preferable examples of the solvent to be used in preparing thecomposition of the present invention includes esters such as ethylacetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamylacetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethylbutyrate, butyl butyrate, alkyl esters, methyl lactate, ethyl lactate,methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methoxymethylacetate, methoxy ethylacetate, methoxy butylacetate, ethoxymethylacetate, ethoxy ethylacetate,

3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate or ethyl3-oxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate,methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, methyl2-methoxypropionate, ethyl 2-methoxypropionate, propyl2-methoxypropionate, methyl 2-ethoxypropionate, ethyl2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, ethyl2-ethoxy-2-methylpropionate,

methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate,ethyl acetoacetate, methyl 2-oxobutanate, or ethyl 2-oxobutanate; etherssuch as diethylene glycol dimethyl ether, tetrahydrofuran, ethyleneglycol monomethyl ether, ethylene glycol monoethyl ether, methylcellosolve acetate, ethyl cellosolve acetate, diethylene glycolmonomethyl ether, diethylene glycol monoethyl ether, diethylene glycolmonombutyl ether,

propylene glycol methyl ether, propylene glycol methyl ether acetate,propylene glycol ethyl ether acetate, or propylene glycol propyl etheracetate; ketones such as methylethyl ketone, cyclohexane, 2-heptanone,or 3-heptanone; and aromatic hydrocarbons such as toluene and xylene.

Among these, as the solvent to be used in the present invention, methyl3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate,ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl3-methoxypropionate, 2-heptanone, cyclohexane, ethyl carbitol acetate,butyl carbitol acetate, propylene glycol methyl ether, propylene glycolmethyl ether acetate and the like are more preferable.

Variety of additives, such as fillers, high-molecular compounds otherthan the above-mentioned ones, surfactants, adherence promotors,oxidization inhibitors, ultraviolet absorbers, aggregation inhibitorsand the like can be compounded to the composition of the presentinvention.

Specific examples of these additives include fillers such as glasses oralumina; high-molecular compounds other than binder resins such aspolyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkylether, or polyfluoroalkyl acrylate; surfactants such as nonionicsurfactants, cationic surfactants, or anionic surfactants; adhesionpromotors such as vinyl trimethoxysilane, vinyl triethoxysilane, vinyltris(2-methoxyethoxy)silane,N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane,N-(2-aminoethyl)-3-aminopropyltrimethoxysilane,3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane,3-glycidoxypropylmethyldimethoxysilane,2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane,3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane,3-methacryloxypropyltrimethoxysilane, or3-mercaptopropyltrimethoxysilane; oxidation inhibitors such as2,2-thiobis(4-methyl-6-t-butylphenol) or 2,6-di-t-butylphenol;ultraviolet absorbers such as2-(3-t-butyl-5-methyl-2-hydroxyphenol)-5-chlorobenzotriazole oralcoxybenzophenone; and aggregation inhibitors such as sodiumpolyacrylate.

Further, when a promotion of an alkali solubility of a radiationunirradiated portion is intended for further improvement in adevelopability of the composition of the present invention, an organiccarboxylic acid, preferably a low-molecular weight organic carboxylicacid having a molecular weight of 1000 or less, can be added to thecomposition of the present invention. Specific examples of the organiccarboxylic acid include aliphatic monocarboxylic acids such as formicacid, acetic acid, propionic acid, lactic acid, valeric acid, pivalicacid, caproic acid, diethylacetic acid, enanthic acid, or caprylic acid;aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinicacid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaicacid, sebacic acid, brasylic acid, methylmalonic acid, dimethylmalonicacid, methylsuccinic acid, tetramethylsuccinic acid, or citraconic acid;aliphatic tricarboxylic acids such as tricarballylic acid, aconiticacid, or camphoronic acid; aromatic monocarboxylic acids such as benzoicacid, toluic acid, cuminic acid, hemellitic acid, or mesitylenic acid;aromatic polycarboxylic acids such as phthalic acid, isophthalic acid,terephthalic acid, trimellitic acid, trimesic acid, mellophanic acid, orpyromellitic acid; and other carboxylic acids such as phenylacetic acid,hydratropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinicacid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate,cinnamylidene acetic acid, coumaric acid, or unbellic acid.

Positive Composition

In order to obtain a positive image, in other words, when thecomposition of the present invention is a positive composition, thecomposition of the present invention contains a sensitizer incombination with a solvent. Preferable examples of the sensitizerinclude naphthoquinonediazide compounds. Further, thecolorant-containing curable positive composition may contain a curingagent.

Examples of the above-mentioned naphthoquinonediazide compound includeo-benzoquinonediazide sulfonic acid ester and o-naphthoquinonediazidesulfonic acid ester.

Specific examples thereof include o-naphthoquinonediazide-5-sulfonicacid ester, o-naphthoquinonediazide-5-sulfonic acid amide,o-naphthoquinonediazide-4-sulfonic acid ester,o-naphthoquinonediazide-4-sulfonic acid amide, and the like. Theseesters and amide compounds can be manufactured by commonly-known methodssuch as those disclosed in Japanese Patent Application Laid-Open (JP-A)Nos. 2-84650 or 349437, which use phenolic compounds represented by“Formula (I)”.

When the composition of the present invention is a positive composition,the above-mentioned alkali soluble phenolic resin and theabove-mentioned curing agent are generally preferably dissolved in theorganic solvent at a rate of about 2 to 50% by mass and about 2 to 30%by mass respectively. The above-mentioned naphthoquinonediazide compoundand that of the above-mentioned organic solvent soluble dye aregenerally preferably added to the solution in which the above-mentionedalkali soluble resin and curing agent are dissolved, at a rate of about2 to 30% by mass and about 2 to 50% by mass respectively, from theviewpoints of curability, spectral characteristic, and the like.

Preferable examples of the above-mentioned curing agent include themelamine compounds, the methylol-group containing compounds and the likewhich are mentioned above as the crosslinking agents.

When the composition of the present invention is a positive composition,alkali soluble resins may be used by being mixed therein, and examplesof the alkali soluble resins include novolak resins, vinyl phenolicresins, and the like.

Further, when the colorant-containing curable composition of the presentinvention is configured to be a positive composition, it can beconfigured by including a compound represented by the above-mentionedFormula (I), a photo-acid generator, and a curing agent.

The photo-acid generator is not particularly limited, provided that itis a compound which generates an acid when exposed to light, however,preferable examples thereof include various oxime compounds such asα-(4-toluenesulfonyloxyimino)phenylacetonitrile, various iodoniumcompounds, various sulfonium compounds, various trihalomethyltriazinecompounds, and the like.

Color Filter

The color filter of the present invention contains at least a compoundrepresented by the above-mentioned Formula (I) as a colorant. Inaddition, it is preferable that the color filter is manufactured byusing the composition of the present invention.

The color filter of the present invention can be manufactured by coatingthe composition of the present invention on a support by using a coatingmethod, such as a spin coating, a casting coating, or a roll coating, toform a radiation-sensitive composition layer, exposing the resultant tolight through a prescribed mask pattern, and developing the resultantwith a developing solution to form a colored pattern. Further, themanufacturing method for the color filter of the present invention mayinclude a process for curing the above-mentioned resist pattern byheating and/or exposing to light, in accordance with necessity.Moreover, the process for curing by heating and/or or exposing to lightmay be carried out a plurality of times.

Preferable examples of the radiation used in this case includeultraviolet radiation such as g-ray, h-ray or i-ray.

Examples of the above-mentioned support include soda glass, PYREX®glass, silica glass, and these to which a transparent electricallyconductive film is deposited; a photoelectric transducer substrate suchas a silicone substrate, which is used in image pickup elements or thelike; a complementary metal oxide semiconductor (CMOS), and the like.Black stripes for optically isolating the respective pixels may beformed on these supports.

Further, in view of improving adherence the substrate to the upperlayer, preventing substance diffusion, and/or flattening the substratesurface, an undercoating layer may be provided on the support inaccordance with necessity.

Any developing solution can be used as the developing solution involvedin the manufacturing method for the above-mentioned color filter of thepresent invention, provided that it is a composition which dissolves thecomposition of the present invention, but do not dissolveradiation-irradiated portions. Specific examples thereof include acombination of various organic solvents and alkaline aqueous solutions.

Examples of the above-mentioned organic solvents include theaforementioned solvents which are used in preparing the composition ofthe present invention.

Examples of the alkaline aqueous solution include an alkaline aqueoussolution in which an alkaline compound such as sodium hydroxide,potassium hydroxide, sodium carbonate, sodium silicate, sodiummetasilicate, ammonia water, ethylamine, diethylamine,dimethylethanolamine, tetramethylammoniumbydroxide,tetraethylammoniumhydroxide, choline, pyrrole, piperidine or1,8-diazabicyclo-[5.4.0]-7-undecene is dissolved such that aconcentration thereof becomes 0.01 to 10% by mass, preferably 0.01 to 1%by mass. When a developing solution consisting of such an alkalineaqueous solution is used, the color filter is generally cleaned withwater after a development.

Further, the color filter of the present invention can be used for solidimage pickup elements such as a liquid crystal display device or a CCD,and is particularly suited for use with CCDs and CMOSs which have a highresolution of over one million pixels, and the like. The color filter ofthe present invention can be used as a color filter to be disposedbetween the light receiving part of the respective pixels constitutingthe CCD and condensing microlenses, for example.

EXAMPLES

Hereinafter, the present invention will be more specifically describedwith examples. However, the present invention is not limited by thefollowing examples, in other words, other forms of the invention may beproduced within the spirit or scope of the invention as defined in theappended claims. In the following description, the words “part” and “%”are used based on mass unless otherwise noted.

Example of Synthesis 1

Synthesis of Exemplified Compound (1)

In accordance with the following scheme, synthesis of the compound(colorant) in the present invention was conducted.

11.28 g of cyclohexylamine [the above-mentioned compound (1)], 27 g of4-methoxy-2-nitrobenzenesulfonylchloride, 54 ml of orthodichlorobenzen,and 4.3 ml of distilled water were mixed, and stirred for 1 hr at roomtemperature. After being stirred, the mixture was heated to 50° C.,which was followed by adding an aqueous solution of 5.69 g of sodiumcarbonate to the mixture, and further stirring it for 1 hr at atemperature of 70° C. Then, the reaction mixture was poured into water,and extracted with ethyl acetate, and the ethyl acetate phase was washedwith 4% sulfuric acid in water. Thereinafter, magnesium sulfate andactivated carbon were added to the ethyl acetate phase for drying anddecoloring it, and the dried and decolored ethyl acetate phase wassubjected to the celite filtration. This ethyl acetate phase wasconcentrated to obtain the above-mentioned compound (2).

Then, 35 g of reduced iron, 25 g of acetic acid, and 75 g of water weremixed, and stirred at 80° C., and to the mixture, the compound (2)obtained in the above-mentioned manner was gradually added, then themixture was stirred for 2 hr at 80° C. Then, 26 ml of ethanol was addedto the reaction mixture, which was then refluxed and stirred for 2.5 hr.After being stirred, the reaction mixture was cooled to roomtemperature, and after 32.5 g of sodium carbonate being added thereto,200 ml of acetic acid, and celite and activated carbon were furtheradded for celite filtration. Then, the organic layer was steam-distilledto obtain 24.78 g of the above-mentioned compound (3) (the overall yieldwas 80%).

Then, 5.69 g of the above-mentioned compound (3), 0.09 g oftetraethylanimoniumchloride, 100 ml of acetic acid, 7.3 ml of 36%hydrochloric acid, and 11 ml of distilled water were mixed, and cooledto 0° C. To the mixture, an aqueous solution of sodium nitrite (NaNO₂:1.4 g; and water: 10 g) was added dropwise with the internal temperaturebeing kept at 5° C. or lower, and after the drip addition, the mixturewas stirred for 3 hr with the temperature being maintained at 5 to 10°C. to obtain a diazo solution.

The diazo solution was added dropwise into a separately prepared slurrysolution of 3-amino-1-phenyl-2-pyrazoline-5-one (3.71 g of3-amino-1-phenyl-2-pyrazoline-5-one, 40 g of water, and 2.14 g of 36%hydrochloric acid) over a time period of 30 min at 0° C. or below. Then,38 ml of a 40% aqueous solution of sodium acetate was dropped into theslurry solution over a time period of 1 hr, which was then followed byadding dropwise 50 ml of 10% aqueous sodium carbonate, and stirring overnight. Then, 100 ml of a 50% aqueous solution of sodium hydroxide wasadded dropwise into the mixture, which was heated to 65° C., and stirredfor 1 hr before being cooled to room temperature. The obtained mixturewas filtered, and washed with an alkaline saline solution to obtain 6.80g of the above-mentioned exemplified compound (1), which is the compound(dye) as the object of the present invention (the yield was 75%).

The exemplified compound (1) obtained in the above-mentioned way wasanalyzed by NMR for structure verification with the following data beinggiven. ¹H-NMR (300 MHz; solvent: dimethyl-d₆-sulfoxyde; standardsubstance: tetramethylsilane) δ 7.95 ppm (2H, d), 7.80 (2H, m), 7.62(1H, s), 7.43 (2H, t), 7.15 (1H, t), 6.85 (1H, d), 6.65 (2H, s), 3.95(3H, s), 3.10 (1H, m), 1.60 (4H, m), 1.43 (1H, m), 1.25 to 0.85 (6H, m).

Further, the above-mentioned exemplified compound (1) was dissolved intomethanol to prepare a solution having a concentration of approx.1.0×10⁻⁵ mol/l, and by using a spectrophotometer (trade name: UV-2500PC,manufactured by Shimadzu Corporation), measurement of the maximalabsorption wavelength (λmax) and molar absorption coefficient (ε), aswell as measurement of the peak width at half height from the wavelengthwere carried out. As a result of this, it was found that, in methanol,λmax=384 nm, and ε=25800 (1·mold⁻¹cm⁻¹) (peak width at half height=70.5nm).

Example 1

1) Preparation of Resist Solution

The following compositions were mixed and dissolved to prepare a resistsolution.

Compositions for resist solution Propyleneglycolmonomethyl ether acetate(PGMEA) 19.00 parts Ethyl lactate 36.00 parts Cyclohexanone  0.87 partsBinder (PGMEA solution containing 41% of 30.51 partsacrylmethacrilate/methacrylic acid copolymer (molar ratio = 65:35))Dipentaerythritolhexacrilate 12.20 parts Polymerization inhibitor(p-methoxyphenol) 0.0075 parts  Fluorine surfactant (trade name:MEGAFACE ®  0.95 parts F177P, 0.2% ethyl lactate solution, manufacturedby Dainippon Ink And Chemicals, Inc.)2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]- 0.600 parts 1,2-octanedion(photopolymerization initiator)

2) Preparation of Glass Substrate having Undercoating Layer

A glass substrate (trade name: CORNING 1737, manufactured by CorningInc.) was ultrasonically washed with 1% NaOH water, which was thenfollowed by water washing and dehydration baking (for 30 min at 200°C.).

Next, the above-mentioned resist solution was applied to the washedglass substrate to provide a film thickness of 2 μm by means of a spincoater, and heated to be dried for 1 hr at 220° C. for formation of acured film to obtain a glass substrate having an undercoating layer.

3) Preparation of Colorant-containing Resist Solution

9.4 g of the resist solution obtained in the above paragraph 1) and 0.6g of the above-mentioned exemplified compound (1) [colorant: a compoundrepresented by the Formula (I)] were mixed and dissolved to obtain thecolorant-containing resist solution.

4) Light Exposure and Development Processing of Colorant-containingResist (Image Formation)

The dye resist solution obtained in the above paragraph 3) was appliedto the undercoating layer of the glass substrate having an undercoatinglayer obtained in the above paragraph 2) to provide a film thickness of1.0 μm by using a spin coater, and prebaked for 120 sec at 120° C.

Next, by using an exposing apparatus, the coated film was irradiated atan amount of exposure of 800 mJ/cm² with a wavelength of 365 nm througha mask having a thickness of 20 μm. After the exposure, the coated filmwas processed for development under the conditions of 26° C. and 60 secby using a developing solution (trade name: CD-2000; concentration: 60%,manufactured by FUJIFILM Arch Co., Ltd.) Thereinafter, the coated filmwas rinsed for 20 sec with running water, which was then followed byspray drying for image formation.

In the present example, the image formation was verified in the normalway by using an optical microscope and SEM photographic observation.

Further, the “developability of the unexposed parts” and the “percentageof film remaining in the exposed parts” were measured with a chromoscope(trade name: MCPD-1000, manufactured by Otsuka Electronics Co., Ltd.).

The “developability of the unexposed parts” refers to the rate of changein absorbance for the film before and after the development, and for alight sensitive negative composition, the greater the value, the better.Further, the “percentage of film remaining in the exposed part” refersto the ratio of maintained light absorbance for the film before andafter development, and for a light sensitive negative composition, thegreater the value, the better.

That the above-mentioned developability of the unexposed part and theabove-mentioned percentage of film remaining in the exposed part areboth high values means that pattern formability is good.

In the present example, the “beat resistance” was determined by heatingthe glass substrate coated with a dye resist solution for 1 hr at 200°C. by use of a hot plate, and then measuring the change in chromaticity,i.e., the ΔEab value, with a chromoscope (trade name: MCPD-1000,manufactured by Otsuka Electronics Co., Ltd.). The smaller the ΔEabvalue, the higher the heat resistance.

The “light resistance” was determined by irradiating the glass substratecoated with a dye resist solution with a Xenon lamp at 200,000 lux for10 hr (equivalent to 2,000,000 lux hours), and then measuring the changein chromaticity, i.e., the ΔEab value. The smaller the ΔEab value, thehigher the light resistance.

The molar absorbance coefficient (ε) was calculated from the absorbancein methanol. As the color value, the value obtained by dividing themolar absorbance coefficient (ε) by the Mw of the dye, i.e., ε/Mw wasused.

Table 1 gives the results of these.

Examples 2 to 7

The image was formed in the same way as in Example 1, and the evaluationwas carried out in the same manner except that, in the preparation ofthe colorant-containing resist solution as described in 3) in Example 1,the colorant was substituted by the compounds as shown in Table 1 below.The results are given in Table 1 below.

Examples 8 to 14

Except that the glass substrate in Examples 1 to 7 was substituted by asilicone wafer substrate, the image was formed in the same way as inExample 1. For the developability of the unexposed part and the filmremaining percentage for the exposed part, the same results as inExamples 1 to 7 were obtained.

Examples 8 to 14 use a silicone wafer substrate, and thus they aredifferent from Examples 1 to 7 in the substrate used, but since thecolorant resist solution is coated on the undercoating layer throughoutExamples 1 to 14, thus there arises no substantial difference, resultingin the same performances having been obtained.

Example 15

The image was formed in the same way as in Example 1, and the evaluationwas carried out in the same manner except that, in the preparation ofthe resist solution as described in 1) in Example 1, thephotopolymerization initiator was substituted by TAZ-107 (trade name,manufactured by Midori Kagaku Co., Ltd.). The results are given in Table1 below.

Example 16

The image was formed in the same way as in Example 1, and the evaluationwas carried out in the same manner except that, in the preparation ofthe resist solution as described in 1) in Example 1, thephotopolymerization initiator was substituted by2-benzyl-2-dimethylamino-4-morpholinobutyrophenone. The results aregiven in Table 1 below.

Comparative Example 1

The image was formed in the same way as in Example 1, and the evaluationwas carried out in the same manner except that, in the preparation ofthe colorant-containing resist solution as described in 3) in Example 1,the colorant was substituted by the following yellow dye (the comparisoncompounds 1 and 2). The results are given in Table 1 below.

TABLE 1 Exposed Molar parts Heat Light absorbance Unexposed percentageresistance resistance coefficient Color parts remaining ΔEab ΔEab εvalue Colorant developability film (200° C./1 h) (2M Lux · 1 h) (1 ·mol⁻¹cm⁻¹) ε/Mw EXAMPLE 1 Exemplified compound (1) 100 100 2.13 2.1225800 55 EXAMPLE 2 Exemplified compound (2) 100 100 2.05 2.23 24200 55EXAMPLE 3 Exemplified compound (5) 100 100 2.55 2.34 24000 52 EXAMPLE 4Mixture of exemplified compound (1) 99 100 3.26 3.28 — — and exemplifiedcompound (2) in ratio of 1:1 (mass) EXAMPLE 5 Mixture of CI Solvent Blue67, 99 99 3.65 3.35 — — exemplified compound (1), and CI Solvent Yellow162 in ratio of 0.7:1.0:1.0 (mass) EXAMPLE 6 Mixture of CI Solvent Blue25, 98 100 3.87 3.65 — — exemplified compound (2), and CI Solvent Yellow162 in ratio of 2.0:1.0:1.0 (mass) EXAMPLE 7 Mixture of CI Solvent Blue25, 97 98 3.92 3.55 — — exemplified compound (5), CI Solvent Yellow 82,and CI Acid Green 16 in ratio of 3.0:2.0:2.0:1.0 (mass) EXAMPLE 15Exemplified compound (1) 99 99 3.26 3.31 25800 55 EXAMPLE 16 Exemplifiedcompound (1) 98 97 3.35 3.43 25800 55 COMPARATIVE Acid yellow 42ditolylguanidine salt: 45 89 43.50 38.50 55300 46.3 EXAMPLEdyestuff/ditolylguanidine = 1/2 (molar ratio) EXAMPLE 17 Exemplifiedcompound (1) 0 0 3.68 3.75 25800 55 EXAMPLE 18 Exemplified compound (1)0 0 3.78 3.68 25800 55

As can be seen from Table 1, with the conventionally-known curablecompositions, such as the comparative example, it has been difficult tosimultaneously meet the requirements for the various performances asgiven in Table 1. However, by using the colorant-containing curablecomposition containing a compound represented by the Formula (I) in thepresent invention, a curable composition which provides excellentperformance in heat resistance, light resistance and color value (ε/Mw)of the colorant could be obtained. At the same time, the developabilityof the unexposed parts and the percentage of film remaining in theexposed parts could be improved, and it has been found that the curablecomposition obtained is excellent in pattern formability.

Especially with the color value having been improved, the amount ofaddition of the dye can be reduced, and the various properties, such asthe pattern formability, can be improved.

As is obvious from the results as given in Table 1, Comparative Example1, is that use of a conventional pyrazolone-azo dye offers substantiallyinferior performances in developability of unexposed parts, precentageof remaining film in exposed parts, heat resistance and lightresistance, and the superiority of the aminopyrazolone-azo dye of thepresent invention has been demonstrated.

Example 17

In the preparation of the colorant-containing resist solution asdescribed in 3) in Example 1, a colored positive photosensitive resincomposition A prepared by the following manner was used in place of thecolorant-containing resist solution to form an image in the same way asin Example 1 except that full-spectrum light exposure was carried out,and the evaluation was carried out in the same manner as in Example 1.The results are also given in Table 1 below.

Preparation of Colored Positive Photosensitive Resin Composition A

The following compositions were mixed and dissolved to prepare a coloredpositive photosensitive resin composition.

Ethyl lactate 75.0 parts Binder (P-1) (shown below) 14.0 partsExemplified compound (1) (a compound 6.0 parts represented by theabove-mentioned Formula (I)) Photo-acid generator (following “PAG-1”)4.0 parts Fluorine surfactant (trade name: F-475, 0.4 parts manufacturedby Dainippon Ink And Chemicals, Inc.)

Example 18

In the preparation of the colorant-containing resist solution asdescribed in 3) in Example 1, a colored positive photosensitive resincomposition B prepared in the following manner was used in place of thecolorant-containing resist solution to form an image in the same way asin Example 1 except that the full-spectrum light exposure was carriedout, and the evaluation was carried out in the same manner as inExample 1. The results are also given in Table 1 below.

Preparation of Colored Positive Photosensitive Resin Composition B

Ethyl lactate 210.0 parts  A novolak resin which is obtained bycondensing 20.0 parts p-crezol and formaldehyde (molecular weight inconverting to polystyrene: 5500) Hexamethoxymethylolmeramine 15.0 partsExemplified compound (1) (a compound represented by 35.0 parts theabove-mentioned Formula (I)) Esterized compound of2,3,4-trihydroxybenzophenone and 15.0 partso-naphthoquinonediazide-5-sulfonylchloride (esterization ratio: 80 mol%; quinonazide compound) Ester of [4-(7,8-dihydroxy-2,4,4-trimethyl-2-15.0 parts chromanyl)pyrrogallol] and o-naphthoquinonediazide-5-sulfonic acid

Because Examples 17 and 18 provide a positive photosensitivecomposition, the lower the value of the developability of the unexposedpart and the percentage of remaining film in the exposed part, the morepreferable.

As can be seen from Table 1, also in Examples 17 and 18, a positivecurable composition which provides excellent performance in heatresistance, light resistance, and color value of the colorant could beobtained.

At the same time, the developability of the unexposed parts and thepercentage of film remaining in the exposed parts could be improved, andit has been found that the curable composition obtained is excellent inpattern formability.

1. A color filter comprising a compound represented by the followingFormula (I):

wherein R¹ and R² each independently represent a hydrogen atom, an alkylgroup having 1 to 21 carbon atoms, an alkenyl group having 2 to 21carbon atoms, an aryl group having 6 to 21 carbon atoms, or an aralkylgroup having 7 to 21 carbon atoms; or R¹ and R² may be formed into aheterocycle together with a jointly bonded nitrogen atom; R³ representsa halogen atom, a trihalomethyl group, an alkoxy group having 1 to 21carbon atoms, a nitro group, or an amino group; n represents an integerof 0 to 4; R⁴ a halogen atom or a —SO₃M group, in which M represents ahydrogen atom, a cation of a metallic atom, or a cation consisting of anitrogen-containing compound; and m represents an integer of 0 to
 5. 2.The color filter of claim 1, comprising a colorant-containing curablecomposition which comprises a colorant containing a compound representedby the above Formula (I).